Search results for "Dry etching"
showing 3 items of 3 documents
Plasma Etching and Integration with Nanoprocessing
2009
This chapter introduces plasma etching—an extensive and perhaps the most widely used micro- and nanoprocessing method both in industry and in research and development laboratories worldwide. The emphasis is on the practical methods in plasma etching and reactive ion etching when used for submicron and nanoscale device fabrication. The principles of plasma etching and reactive ion etching equipment for sample fabrication will be introduced.
Power ultrasound irradiation during the alkaline etching process of the 2024 aluminium alloy
2015
Abstract Prior to any surface treatment on an aluminum alloy, a surface preparation is necessary. This commonly consists in performing an alkaline etching followed by acid deoxidizing. In this work, the use of power ultrasound irradiation during the etching step on the 2024 aluminum alloy was studied. The etching rate was estimated by weight loss, and the alkaline film formed during the etching step was characterized by glow discharge optical emission spectrometry (GDOES) and scanning electron microscope (SEM). The benefit of power ultrasound during the etching step was confirmed by pitting potential measurement in NaCl solution after a post-treatment (anodizing).
Nonstoichiometric silica mask to fabricate reverse proton-exchange waveguides in lithium niobate crystals
2004
Producing channel waveguides requires a photolithographic mask, but the standard technique of using thermally evaporated metal films for proton exchange has proved to be unsuitable for withstanding the rather aggressive process of reverse proton exchange. We report the fabrication of a nonstoichiometric silica mask by ion-plating plasma-assisted deposition. This mask is strong enough to resist both direct and reverse proton exchange and is also compatible with anisotropic dry etching for patterning the mask and with electric field poling. Our technique is a practical alternative to the use of SiO2 sputtered masks.